Materials science reports : a review journal
Glow-discharge amorphous silicon: growth process and structure / Kazunobu Tanaka and Akihisa MatsudaNew permanent magnet materials / K.H.J. BuschowPhoto- and radiation-sensitive materials in microlithography / M. TsudaPolymer degradation by crazing and its study by small angle scattering techniques / H.R. BrownChemical and electronic structure of the SiO2/Si interface / F.J. Grunthaner and P.J. GrunthanerLattice site occupation of non-soluble elements implanted in metals / O. Meyer and A. TurosMetal-organic vapor phase epitaxy of compound semiconductors / T.F. KuechKinetics of solid phase crystallization in amorphous silicon / G.L. Olson and J.A. RothPhotoinduced deposition of thin films / M. HanabusaMetal/semiconductor contact resistivity and its determination from contact resistance measurements / A. Scorzoni and M. FinettiMaterials for infrared fibre optics / J.A. SavageSemiconductor surface passivation / L.G. Meiners and H.H. WiederPseudoline electron beam recrystallization of silicon-on-insulator / Susumu Horita and Hiroshi IshiwaraSelf-propagating exothermic reactions: the synthesis of high-temperature materials by combustion / Zuhair A. Munir and Umberto Anselmi-TamburiniPhase formation in metastable solidification of metals / Berndt FeuerbacherIon implantation and annealing of crystalline oxides / C.W. White ... [et al.]Crystallographic analysis and observation of surface micro-areas using microprobe reflection high-energy electron diffraction / Masakazu IchikawaEpitaxial growth and properties of YBaCuO thin films / J. Geerk, G. Linker and O. MeyerAtomic layer epitaxy / Tuomo SuntolaIon implantation for isolation of III-V semiconductors / S.J. PeartonA review of thin-film aluminide formation / E.G. ColganThermodynamic and fractal geometric aspects of ion-solid interactions / Yang-Tse ChengStable and epitaxial metal/III-V semiconductor heterostructures / T. Sands ... [et al.]X-ray and neutron reflectivity for the investigation of polymers / T.P. RussellDevelopment of Ohmic contact materials for GaAs integrated circuits / Masanori MurakamiEpitaxial growth of transition-metal silicides on silicon / L.J. Chen and K.N. TuThermodynamics and kinetics of phase transformations induced by ion irradiation / M. Nastasi and J.W. MayerIon-beam-induced epitaxial crystallization and amorphization in silicon / Fransesco Priolo and Emanuele RiminiDamage formation and annealing of ion implantation in Si / M. TamuraIon beam assisted thin film deposition / James K. HirvonenPre-amorphization damage in ion-implanted silicon / R.J. Schreutelkamp ... [et al.]Transport and degradation in transition metal oxides in chemical potential gradients / Manfred MartinDislocations in strained-layer epitaxy: theory, experiment, and applications / E.A. FitzgeraldIon-implanted structures and doped layers in diamond / Johan F. PrinsIon beam synthesis of epitaxial silicides: fabrication, characterization and applications / [S. Mantl]Electromigration in thin-film interconnection lines: models, methods and result / Andrea Scorzoni ... [et al.]Growth and characterization of epitaxial Ni and Co silicides / H. von KänelPressure-induced amorphous phases / E.G. Ponyatovsky and O.I. BarkalovAtomic layer epitaxy of III-V compounds using metalorganic and hydride sources / M. OzekiSynchrotron X-radiation topography / B.K. Tanner and D.K. Bowen
isPartOf
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Materials science reports : a review journal
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associatedMedia
<http://www.sciencedirect.com/science/journal/09202307>
inLanguage
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mainEntityOfPage
name
Materials science reports : a review journal
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sameAs
label
Materials science reports : a review journal