Doi, Toshiro K. et al. Advances in CMP/Polishing Technologies for the Manufacture of Electronic Devices. Oxford; Waltham, MA: Elsevier, 2012.
Doi, Toshiro K. et al. Advances in CMP/Polishing Technologies for the Manufacture of Electronic Devices. Oxford; Waltham, MA: Elsevier, 2012.
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identifier
2000091996
created
2015-02-27T17:22:48
license
title
Doi, Toshiro K. et al. Advance ...... ; Waltham, MA: Elsevier, 2012.
shortTitle
Doi et al. Advances in CMP/Polishing Technologies (2012)